M

Principal Engineer – NAND Process Pathfinding – Dry Etch

Micron Technology

Singapore · Full Time

Be the first to apply

Experience
7–10 yrs
Salary
Openings
1
Posted
4 hours ago
Work mode
In office
Education
MS or PhD in relevant field
Resume
Required to apply

Where you'll work

Sign in to tell us what does and doesn't work for you here — it sharpens every match we show you.

Job description

Company and Team Overview

At Micron Technology, we aim to revolutionize how information enriches lives globally. Join an inclusive group driven by innovation, integrity, and community impact. Our Advanced NAND Process Pathfinding Team pioneers next-gen memory technology, pushing the limits of semiconductor breakthroughs.

Role Summary

As Principal Engineer focused on Dry Etch within Advanced NAND R&D, you'll innovate with cutting-edge dry etch processes and equipment. Collaborate with process integration and other domains like Wet Etch, CVD, Diffusion, Metals, Lithography, and CMP. Manage groundbreaking dry etch chambers and steer the process roadmap targeting program milestones and yield improvement.

Key Responsibilities

  • Invent and refine advanced dry etch techniques that satisfy structural, electrical, yield, and integration demands along the NAND technology roadmap.
  • Develop innovative plasma chemistries, process technologies, and equipment capabilities for future technology nodes.
  • Utilize advanced data science methods including AI/ML and statistical tools to expedite process insights and enhance dry etch performance.
  • Lead process pathfinding initiatives through automation, predictive modeling, and data-driven decision making.
  • Cooperate extensively with Process Integration, Thin Films, Wet Etch, Diffusion, Lithography, CMP, and Device teams to advance technology and manufacturability.
  • Leverage AI-powered engineering solutions and digital workflows to speed R&D, improve decisions, and optimize thin film technology innovations.

Minimum Qualifications

  • Hands-on experience with ICP and/or CCP plasma etching in semiconductor process development contexts.
  • Strong knowledge of plasma-surface interactions, etch chemistry, profile control, and fundamentals of dry etch equipment.
  • Sound grounding in plasma physics, material interactions, and semiconductor integration principles.
  • Proven experience developing dry etch processes for advanced semiconductor technologies.
  • Familiarity with statistical analyses, data analytics, and methods for optimizing process performance.
  • Excellent collaborative skills capable of effective multidisciplinary teamwork.

Preferred Qualifications

  • Advanced degree (PhD/MS) plus 7 to 10 years of relevant dry etch or semiconductor process development experience.
  • Expertise in high aspect ratio etching, selective etching, advanced pattern transfer, and process structural optimization.
  • Experience applying machine learning, predictive modeling, automation, or virtual process simulation in tech development.
  • Strong analytical problem-solving aptitude with ability to work independently in a rapidly evolving environment.
  • Outstanding communication and presentation skills.
  • Experience leading technical projects or mentoring engineers is advantageous.

Additional Information

Micron offers a collaborative culture where curiosity thrives and your work impacts critical AI, automotive, mobile, and data center memory innovations worldwide. We provide an equal opportunity workplace, prohibit child labor, and do not charge any recruitment fees. Applicants are encouraged to use AI tools ethically when applying.

For accommodation requests during application, contact support as listed in the official communications.

Minimum education

Master's Degree

How they work

Communication Teamwork & Collaboration Problem Solving Leadership Independence

Leave it if you'd like a reply — we won't use it for anything else.

Click to browse, drag & drop, or paste a screenshot

PNG, JPG, GIF, MP4, WebM, MOV · Max 20MB each · Up to 5 files

🤖
Online · instant AI help
Broxer